Uniform Deposition of Titanium Dioxide Films by Chemical Vapor Deposition (CVD)
نویسندگان
چکیده
منابع مشابه
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ژورنال
عنوان ژورنال: Applied Mechanics and Materials
سال: 2015
ISSN: 1662-7482
DOI: 10.4028/www.scientific.net/amm.773-774.744